DEVELOPMENT PROCESSING DEVICE AND DEVELOPMENT PROCESSING METHOD

摘要

A development processing device has a substrate holding section for holding a substrate, a heater installed at the substrate holding section and heating on the substrate holding section the substrate in order to subject a resist film to PEB processing, a cooler for cooling on the substrate holding section the substrate, a development liquid nozzle for supplying on the substrate holding section a development liquid to the substrate, and a controller for individually controlling the heater, cooler, and development liquid nozzle.