| 摘要 |
<p>A hardened nano-imprinting stamp (10) includes a plurality of silicon-based nano-sized features (12) that have a hardened shell (20) of silicon carbide, silicon nitride, or silicon carbide nitride. The hardened shell (20) is made harder than the underlying silicon by a plasma carburization and/or a plasma nitridation process. During the plasma process, atoms of carbon C and/or nitrogen N bombard and penetrate a plurality of exposed surfaces (12e, 12s, 12t, 12b, 12f, 13) of the nano-sized features 12 and chemically react with the silicon (Si) to form the hardened shell (20) of silicon carbide, silicon nitride, or silicon carbide nitride. The lifetime, durability, economy, and accuracy of the resulting hardened nano-imprinting stamp (10) are improved.
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