Positioning apparatus, atmosphere substituting method, exposure apparatus, and device manufacturing method

摘要

A positioning apparatus of an exposure apparatus includes a chamber, a substituting unit for substituting a gas in the chamber from a first gas to a second gas, a static pressure gas bearing provided in the chamber, a gas supply unit for supplying the second gas to the static pressure gas bearing, a control unit for controlling the gas supply unit to supply the second gas to the static pressure gas bearing when the substituting unit substitutes the gas in the chamber from the first gas to the second gas, and a bearing exhaust unit for exhausting the gas of the static pressure gas bearing.