发明名称 |
MANAGEMENT SYSTEM AND APPARATUS, METHOD THEREFOR, AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>A management apparatus which manages a parameter for an industrial device acquires AGA measurement results obtained by operating the industrial device with an operation job parameter value and non-operation job parameter value. An inspection apparatus acquires an "inspection result" obtained by inspecting the result of operating the industrial device in the operation job. A change in inspection result upon a change in parameter value is estimated on the basis of the AGA measurement result and inspection result. A variable which minimizes (extreme) both or at least one of the sensitivity (slope) of the inspection result upon a change in parameter value and variations (3Ã) in inspection result between objects to be processed (e.g., wafers) is set as an optimal parameter.</p> |
申请公布号 |
KR100545420(B1) |
申请公布日期 |
2006.01.24 |
申请号 |
KR20030027396 |
申请日期 |
2003.04.30 |
申请人 |
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发明人 |
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分类号 |
G03F9/00;H01L21/027;G03F7/20;G05B19/418 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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