PLASMA PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATE,申请号KR20010008517-传众专利搜索

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发明名称	PLASMA PROCESSING APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
摘要
申请公布号	KR100545034(B1)	申请公布日期	2006.01.24
申请号	KR20010008517	申请日期	2001.02.20
申请人		发明人
分类号	H01L21/3065;H01J37/32;H01L21/00	主分类号	H01L21/3065
代理机构		代理人
主权项
地址

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