发明名称 |
Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program |
摘要 |
The transmission or reflection loss due to surface contamination of a mask is predicted as a function of position on the mask and time. At the time of an exposure compensation for the transmission or reflection loss is effected using a device capable of adjusting the beam intensity across the length of an exposure field.
|
申请公布号 |
US6989544(B2) |
申请公布日期 |
2006.01.24 |
申请号 |
US20020315228 |
申请日期 |
2002.12.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER VEEN PAUL |
分类号 |
A61N5/00;G03F1/14;G03F7/20;H01L21/027 |
主分类号 |
A61N5/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|