METHOD OF PHOTORESIST ASH RESIDUE REMOVAL,申请号KR20000007834-传众专利搜索

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发明名称	METHOD OF PHOTORESIST ASH RESIDUE REMOVAL
摘要
申请公布号	KR100544970(B1)	申请公布日期	2006.01.24
申请号	KR20000007834	申请日期	2000.02.18
申请人		发明人
分类号	H01L21/302;G03F7/42;H01L21/02;H01L21/027;H01L21/304;H01L21/306;H01L21/3065;H01L21/311;H01L21/3213	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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