METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION OF FINE PATTERN,申请号KR20030090187-传众专利搜索

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发明名称	METHOD AND SYSTEM FOR MEASURING CRITICAL DIMENSION OF FINE PATTERN
摘要
申请公布号	KR100543467(B1)	申请公布日期	2006.01.20
申请号	KR20030090187	申请日期	2003.12.11
申请人		发明人
分类号	H01L21/66;G01Q10/04;H01J37/22;H01J37/28;H01L21/027	主分类号	H01L21/66
代理机构		代理人
主权项
地址

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