| 摘要 |
<P>PROBLEM TO BE SOLVED: To equate the intensity distribution of near-field light in each slit in a photomask used for near-field exposure. <P>SOLUTION: Exposure is made by exposure light having a wavelength of 436nm by using the photomask. Five slits (s) are formed mutually in parallel in a light-shielding film 102 in the photomask. The opening length of each slit (s) is 2,000nm, and the pitch (p) (distance between centers) between respective slits S is 100nm. The opening width of three inner slits S is set to 40nm, and that of two outer slits S is set to 50nm. As a result, when exposure is made by exposure light having a wavelength of 436nm, the intensity distribution of near-field light in each slit (s) can be made equal. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
