| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner for EUV light being constituted by using a plurality of reflective members in which occurrence of aberration due to the plurality of reflective members can be suppressed while preventing throughput from lowering. <P>SOLUTION: In the aligner for exposing a mask pattern onto a wafer W by illuminating a mask M with extreme UV light being emitted from a light source section 2, a plurality of reflective members are arranged on the optical path between the light source section and the mask. Assuming that the axis passing the center of an extreme UV light beam being emitted from the light source section toward a collimator mirror 4 arranged on the optical path closest to the light source side among the plurality of reflective members is a reference axis X, the reference axis X has an angle within 45° against the vertical direction and the collimator mirror 4 is arranged such that the angle between the reference axis and a normal at a point where the reference axis intersects the reflective surface of the collimator mirror 4 falls within 30°. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
