| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a thin-film transistor panel, capable of simplifying a step of manufacturing the thin-film transistor panel and saving the production cost and production time of the thin-film transistor panel. SOLUTION: The method of manufacturing the thin-film transistor panel includes a step of forming a first wiring on a substrate, a step of forming in sequence a first insulating layer and a semiconductor layer on the first wiring, a step of patterning the semiconductor layer and the first insulating layer through one photolithography process to different shapes and a step of forming a second wiring. COPYRIGHT: (C)2006,JPO&NCIPI |
