| 摘要 |
PROBLEM TO BE SOLVED: To prevent adhesion of particles to a substrate or precipitation of a crystal even if a liquid recovery type nozzle apparatus is employed for treating a substrate. SOLUTION: The substrate treatment apparatus 10 is for carrying out a prescribed treatment (washing treatment in this embodiment) for a substrate B which is being transported in an approximately horizontal posture along a transportation path 171 by supplying a treatment liquid to the substrate B and comprises a liquid recovery type nozzle apparatus 20 (a liquid recovery type nozzle apparatus 20 installed in a third washing chamber 14 in this embodiment) so composed as to recover the treatment liquid (washing water in this embodiment) supplied to the substrate B upstream of the transportation path 171; an air knife 30 for blowing out the washing water on the substrate B toward the downstream; and a liquid-holding nozzle apparatus 40 for supplying washing water for preventing the substrate B from drying between the liquid recovery type nozzle apparatus 20 and the air knife 30. COPYRIGHT: (C)2006,JPO&NCIPI
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