| 摘要 |
In a method for X-ray reflectance measurement in which an intensity of a reflected X-ray is observed for each incident angle, a measuring scale for the incident angle omega is corrected with high accuracy with the use of an analyzer crystal. The corrective operation for the measuring scale is carried out before the reflectance measurement. In the corrective operation, the aperture width of the receiving slit is made wider than in the X-ray reflectance measurement, and the analyzer crystal is inserted in the reflection path, and then the reflected X-ray intensity of the total reflection is detected. Under the corrective condition, the incident angle omega of the incident X-ray to the sample surface can be determined accurately, and thus the measuring scale for the incident angle can be corrected. Thereafter, the analyzer crystal is removed from the reflection path, and the X-ray reflectance measurement for the sample surface is carried out. Since the incident angle can be determined with high accuracy, a high-accurate measurement of reflectance becomes possible.
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