发明名称 Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
摘要 A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
申请公布号 US2006011864(A1) 申请公布日期 2006.01.19
申请号 US20040890381 申请日期 2004.07.14
申请人 ASML NETHERLANDS B.V. 发明人 KOSHELEV KONSTANTIN N.;IVANOV VLADIMIR V.;KOROB EVGENII D.;ZUKAVISHVILI GIVI G.;GAYAZOV ROBERT R.;KRIVTSUN VLADIMIR M.
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
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