发明名称 |
Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby |
摘要 |
A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
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申请公布号 |
US2006011864(A1) |
申请公布日期 |
2006.01.19 |
申请号 |
US20040890381 |
申请日期 |
2004.07.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KOSHELEV KONSTANTIN N.;IVANOV VLADIMIR V.;KOROB EVGENII D.;ZUKAVISHVILI GIVI G.;GAYAZOV ROBERT R.;KRIVTSUN VLADIMIR M. |
分类号 |
H05G2/00;G03F7/20 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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