CHARGED PARTICLE BEAM ALIGNER, METHOD FOR EXPOSING CHARGED BEAM AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To expose without degrading a throughput without the need of another lithography even if a failure occurs on part of a plurality of beams.

SOLUTION: A charged particle beam aligner includes a charged particle beam source 1, a charged particle beam lens 2, charged particle beam deflectors 5 and 6, and a split means 3 for splitting a charged particle beam generated from the beam source into a plurality of beams 16. The aligner further includes a means using an alternative beam to transfer a desired pattern onto a wafer 14 when a predetermined beam among the plurality of beams cannot be transferred onto the wafer 14 to be exposed, for transferring the plurality of split and shaped beams onto the wafer 14.

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