Method for improving electrical conductivity of metals, metal alloys and metal oxides by ion beam implantation

摘要

A method for improving the electrical conductivity of a substrate of metal, metal alloy or metal oxide comprising directing a high energy beam of doping ions from Group VIII onto a substrate. This causes an intermixing of the doping ions with the native oxide of the substrate metal or metal alloy. The native oxide layer is changed from being electrically insulating to electrically conductive. The high-energy beam is an ion beam from a high-energy ion source. The thusly-treated substrate is useable in the manufacture of electrodes for devices such as capacitors and batteries.