| 摘要 |
PROBLEM TO BE SOLVED: To draw a fine pattern at a high speed with high accuracy, the pattern containing a first element having a track width and a second element displaced by a half pitch from the first element on the entire surface of a disk. SOLUTION: For drawing a first element 13 laid over the track width of a transfer pattern and a second element 14 laid on the half of the track width by scanning a disk 11 coated with a resist with an electron beam EB, the drawing apparatus 40 is equipped with a deflecting means 21 to deflect the electron beam EB in a radial direction and with a blanking means 26 to block irradiation of the electron beam except for a drawing part. While the disk is rotated in one direction, the electron beam is deflected in the radial direction within the one track width by the deflecting means to draw the first and second elements 13, 14 within one track width in one rotation using the blanking means. COPYRIGHT: (C)2006,JPO&NCIPI
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