| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a coating composition capable of forming a coating film having excellent crack resistance, preservable stability, transparency, heat resistance and low dielectric as an optical material such as core or clad material for an optical waveguide, a protective film for a TFT substrate for an organic electroluminescence element and for a liquid crystal display element or a semiconductor insulating film such as an interlayer insulating material. <P>SOLUTION: The photosensitive resin composition contains (a) a siloxane polymer obtained by reacting a polysiloxane expressed by general formula (1) to react with an organic silane and (b) a compound producing an acid or a base by light. In formula (1), each of R<SP>1</SP>and R<SP>6</SP>expresses hydrogen, a 1-6C alkyl group, a phenyl group, a 1-6C acyl group or an organic group formed by substituting the same, each of R<SP>2</SP>, R<SP>3</SP>, R<SP>4</SP>and R<SP>5</SP>expresses hydrogen, an alkyl group, an aryl group, an alkenyl group or an organic group formed by substituting the same and (m) expresses 1-1,000. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
