| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an electron source formed by using a surface conduction type electron emitting element, preventing the electrification of the element by using a high resistance film, and preventing the generation of a leak current caused by the existence of the high resistance film. <P>SOLUTION: The high resistance film 7 is formed on an area excluding a conductive film 4 area and a surrounding area thereof after forming a conductive film 4, and a voltage is impressed between element electrodes 2, 3 in an atmosphere containing carbon compound after forming a crack 5 on the conductive film 4 by applying forming treatment. By this, a carbon film 6 extending from the inside of the crack 5 and the end of the crack 5 to the high resistance film 7 is deposited. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
