发明名称 |
METHOD OF DETERMINING EXPOSURE CONDITIONS, EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF PRODUCING DEVICE |
摘要 |
<p>Pattern images are projected under various conditions of liquid prior to exposing a substrate, and exposure conditions for exposing a pattern image on the substrate is determined based on each projection condition of the pattern images. When a pattern image is projected through liquid, a substrate can be excellently exposed in a desired exposure condition according to the condition of the liquid.</p> |
申请公布号 |
WO2006006562(A1) |
申请公布日期 |
2006.01.19 |
申请号 |
WO2005JP12764 |
申请日期 |
2005.07.11 |
申请人 |
NIKON CORPORATION;FUJIWARA, TOMOHARU |
发明人 |
FUJIWARA, TOMOHARU |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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