| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and structure for protecting a semiconductor element which is formed on a substrate from static electricity, relating to an aligner for exposing an insulating substrate with a pattern, and to provide its method and substrate processing equipment. <P>SOLUTION: The aligner 1 comprises projection optical systems 3 and 4 which irradiates a light of a specified wavelength from a light source 2 to an insulating substrate S, a fluid supply mechanism 7 which supplies a non-alkaline and conductive fluid F between the insulating substrate and the projection optical system, and a fluid-recovering mechanism 8 for recovering the fluid supplied on the insulating substrate. With the use of the aligner, the semiconductor element formed on the insulating substrate is protected from staticelectricity caused in the process on the way. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
