| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing method of a substrate component comprising a process for washing the substrate component, and a process for drying the substrate component wherein hydrogen peroxide solution or alcohol is not used even if sterilization is carried out and drying is carried out in a short time and a short device distance in its drying process without setting dry air at a high temperature, and to provide a washing method for providing an extremely clean substrate component which does not cause any failure such as stain or contamination after washing various substrate components by means of pure water. SOLUTION: In the drying process for drying a substrate component which is washed by pure water by spraying air sterilized by using ultraviolet ray, the sterilized air is sprayed by using an air knife after passing through a dust removal filter, and the substrate component is dried. Furthermore, thereafter, the washing method of the substrate component of electronics products additionally employs a method for drying it in prescribed temperature atmosphere inside a constant temperature oven. The washing device employs the method. COPYRIGHT: (C)2006,JPO&NCIPI
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