| 摘要 |
<p>The present invention is a method of coating a substrate in a single zone of a MSVD coater wherein the zone includes at least two bays, comprising running a first bay of a zone including a first target in metal mode and running the second bay including a second target in transition or oxide mode, wherein the ?G of formation of the target oxide being run in transition mode or oxide mode is equal to or less than -160 kcal/mole O<SUB>2</SUB> or the difference in ?G between the target being run in transition mode or oxide mode and the target being run in metal mode is at least 60 kcal/mole O<SUB>2</SUB>.</p> |
