| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having a high resolution and a wide focal-depth range and giving a resist pattern of a good shape. <P>SOLUTION: The positive resist composition contains a resin component (A) whose alkali solubility is varied by the action of an acid and an acid generator component (B), wherein the component (A) contains a resin component (A1) having a constitutional unit (a1) represented by formula (I) and a constitutional unit (a3) having an acid dissociable dissolution inhibiting group comprising a tertiary alkyl group and a resin component (A2) having the constitutional unit (a1), the constitutional unit (a3) and a constitutional unit (a4) having a crosslinking group represented by formula (III). In the formula (I), R represents H or methyl; and m represents an integer of 1-3. In the formula (III), R<SP>3</SP>and R<SP>4</SP>each independently represents a lower alkyl; n represents an integer of 1-3; and A represents a single bond or an organic group whose valence is n+1. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
