发明名称 BARRIER FILMS FOR PLASTIC SUBSTRATES FABRICATED BY ATOMIC LAYER DEPOSITION
摘要 Gas permeation barriers can be deposited on plastic or glass substrates by atomic layer deposition (ALD). The use of the ALD coatings can reduce permeation by many orders of magnitude at thicknesses of tens of nanometers with low concentrations of coating defects. These thin coatings preserve the flexibility and transparency of the plastic substrate. Such articles are useful in container, electrical and electronic applications.
申请公布号 KR20060006840(A) 申请公布日期 2006.01.19
申请号 KR20057021773 申请日期 2005.11.15
申请人 E.I. DU PONT DE NEMOURS AND COMPANY 发明人 CARCIA PETER FRANCIS;MCLEAN ROBERT SCOTT
分类号 H01L21/20;C23C16/40;C23C16/455;G02F1/1333;H01L51/10;H01L51/52 主分类号 H01L21/20
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