发明名称 CRYSTAL MANUFACTURING METHOD AND UNIT, EXPOSURE UNIT AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a crystal manufacturing method capable of manufacturing a crystal excellent in optical characteristics such as internal transmittance by reducing internal faults, and a unit for that. <P>SOLUTION: This is a crystal manufacturing unit in which a single crystal is grown by lowering a crucible in which the feed of the crystalline substance is contained, and has a step in which the feed is melted, and a step in which a temperature distribution is formed, that is, as the crucible is lowered the temperature at the bottom of the crucible is raised. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006016241(A) 申请公布日期 2006.01.19
申请号 JP20040195082 申请日期 2004.07.01
申请人 CANON INC 发明人 ODA HITOSHI
分类号 C30B11/00;C30B29/12;G02B1/02;G02B5/18;H01L21/027 主分类号 C30B11/00
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