| 摘要 |
The waste-gas treating system is designed for treating the waste gas created in general semiconductor processing in production; the waste-gas treating system mainly is provided at one side of a waste-gas treating equipment, and contains therein mainly a condensing tube, a catalyst treating unit, a water treating unit and water collecting tanks; the catalyst treating unit decomposes toxic gases such as per-fluorine compound (PFC) etc. that are remained in the waste-gas treating equipment and are unable to be dealt with to thereby form non-toxic gases, and does water treating on the byproduct from dissociation, thus a function of lowering temperature can be acquired, then the gases are exhausted to the atmosphere to perform secondarily treating to reduce the content of PFC in the atmosphere and to reduce damage of the hothouse effect.
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