METHOD FOR POST-TREATING METAL INTERCONNECTS OF SEMICONDUCTOR DEVICES,申请号KR20040055548-传众专利搜索

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发明名称	METHOD FOR POST-TREATING METAL INTERCONNECTS OF SEMICONDUCTOR DEVICES
摘要
申请公布号	KR20060006487(A)	申请公布日期	2006.01.19
申请号	KR20040055548	申请日期	2004.07.16
申请人	DONGBUANAM SEMICONDUCTOR INC.	发明人	JO, BO YEOUN
分类号	H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
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