| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a color filter manufacturing method, by which edge roughness to a central line is reduced particularly by simultaneous irradiation with a plurality of beams, without using a photomask and by which formation with high definition is possible and a low cost and superior display properties are ensured. <P>SOLUTION: The color filter manufacturing method includes a photosensitive layer forming step of forming at least a photosensitive layer on the surface of a base using a photosensitive composition containing a binder, a polymerizable compound, a colorant and a photopolymerization initiator, an exposure step of exposing the photosensitive layer by simultaneously irradiating the photosensitive layer with a plurality of beams in an inert gas atmosphere, and a developing step of developing the photosensitive layer exposed by the exposure step. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
