| 摘要 |
PROBLEM TO BE SOLVED: To solve a problem that an efficiency of an inclusion fullerene formation is low, when an inclusion fullerene including an atom with an ionic diameter larger than that of an average diameter of a six-membered ring of fullerene is formed by a plasma irradiation method where a plasma of an ionized inclusion atom and a fullerene vapor are irradiated on a deposition substrate in a vacuum chamber. SOLUTION: A fullerene with openings is formed by irradiating an alkali metal ion and a fullerene vapor on a deposition substrate to which a high biased voltage is applied, where a very small amount of water in a vacuum chamber reacts with fullerene by a catalysis of the alkali metal ion. Thus formed fullerene with openings is once recovered and an inclusion atom plasma and the vapor of the fullerene with openings are irradiated on the deposition substrate to form an inclusion fullerene. Since the inclusion of an atom through the openings is possible, the efficiency of the formation of an inclusion fullerene is improved even when a large atom is included. COPYRIGHT: (C)2006,JPO&NCIPI
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