| 摘要 |
PROBLEM TO BE SOLVED: To obtain an insulating film which assures both a low dielectric constant and high mechanical strength by utiling an insulating film raw material composition for CVD including a cyclic siloxane. SOLUTION: An insulating film raw material composition for CVD includes the cyclic siloxane having a substitutional group selected from a group including ethyl group, a vinyl group, an ethynyl group, a propyl group, an aryl group, a buthyl group or a phenyl group. Gas is generated by vaporizing or sublimating the insulating film raw material composition for CVD. The gas is introduced into a reaction vessel wherein a base material is stationarily placed, and turned to plasma to form an insulating film on the base substrate. COPYRIGHT: (C)2006,JPO&NCIPI
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