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发明名称
METHOD FOR FORMING ISOLATION LAYER OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20060006391(A)
申请公布日期
2006.01.19
申请号
KR20040055384
申请日期
2004.07.16
申请人
HYNIX SEMICONDUCTOR INC.
发明人
YOON, HYO GEUN;OH, HOON JUNG
分类号
H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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