SLIT PATTERN AND SCATTEROMETER, METHOD FOR MONITERING D.I CD OF PHOTOMASK USING THEM,申请号KR20040054460-传众专利搜索

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发明名称	SLIT PATTERN AND SCATTEROMETER, METHOD FOR MONITERING D.I CD OF PHOTOMASK USING THEM
摘要
申请公布号	KR20060005606(A)	申请公布日期	2006.01.18
申请号	KR20040054460	申请日期	2004.07.13
申请人	HYNIX SEMICONDUCTOR INC.	发明人	LEE, YOUNG MO;CHOI, BO KYOUNG
分类号	H01L21/66	主分类号	H01L21/66
代理机构		代理人
主权项
地址

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