| 摘要 |
<p>An immersion exposure liquid to be provided between a resist film formed on a substrate and a projection lens for increasing the value of a numerical aperture is obtained by adding, to a solvent, a carbonyl group, a sulfonyl group or the like including a polar molecule having higher polarity than water. Thus, the value of the refractive index of the liquid is increased, so as to improve the resolution without increasing load of the projection lens. As a result, a resist pattern can be formed in a good shape.</p> |
