发明名称 Polishing pad and method of making same
摘要 An article or polishing pad for altering a surface of a work piece includes a polymer matrix created by reaction injection molding of size controlled gas bubbles within a polyurethane matrix. The proposed liquid urethane precursor is first injected into an actuated mold and cured. The molded product is then removed from the mold and double side faced or ground to form a single thin polishing pad comprising a single layer of homogeneous material.
申请公布号 US6986705(B2) 申请公布日期 2006.01.17
申请号 US20040818627 申请日期 2004.04.05
申请人 发明人
分类号 B24D11/00;B24B37/04;B24D3/32;B24D18/00;B29C44/00;B29C44/34 主分类号 B24D11/00
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