Polycyclic fluorine-containing polymers and photoresist for microlithography,申请号HK20040109309-传众专利搜索

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发明名称	Polycyclic fluorine-containing polymers and photoresist for microlithography
摘要
申请公布号	HK1066554(A1)	申请公布日期	2006.01.13
申请号	HK20040109309	申请日期	2004.11.25
申请人	E.I. DU PONT DE NEMOURS AND COMPANY	发明人	FEIRING, ANDREW, E.;SCHADT, FRANK, L., III
分类号	G03F7/032;C08F32/08;C08F232/08;G03F7/039;H01L21/027;(IPC1-7):C08F;G03F	主分类号	G03F7/032
代理机构		代理人
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