| 摘要 |
There is provided a production process of an electroluminescent element, which, even when a buffer layer patterned by a photolithographic process is formed, luminescence failure derived from cross contamination or a variation in film thickness does not take place and can realize high production efficiency. The production process comprises repeating at least twice the step of forming an electroluminescent layer comprising a buffer layer and a luminescent layer by patterning using a photolithographic process, thereby producing an electroluminescent element comprising a patterned electroluminescent layer, and comprises the steps of forming a first pattern part comprising a first buffer layer as the lowermost layer; and coating a solution for second buffer layer formation in a region including said first pattern part, the first buffer layer being immiscible with said solution for second buffer layer formation.
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