发明名称 |
Fotomasken-Rohling, Fotomaske und Bild-Übertragungsverfahren unter Verwendung einer Fotomaske |
摘要 |
A low reflective photomask blank suitable for shortened exposure wavelengths is disclosed. A photomask blank ( 1 ) having a single-layer or multilayer light-shielding film ( 3 ) arranged on a translucent substrate ( 2 ) and mainly containing a metal is characterized by comprising an antireflective film ( 6 ), which at least contains silicon and oxygen and/or nitrogen, on the light-shielding film ( 3 ). |
申请公布号 |
DE112004000235(T5) |
申请公布日期 |
2006.01.12 |
申请号 |
DE20041100235 |
申请日期 |
2004.02.02 |
申请人 |
HOYA CORP., TOKIO/TOKYO |
发明人 |
KUREISHI, MITSUHIRO;MITSUI, HIDEAKI |
分类号 |
C23C14/06;G03F1/32;G03F1/68;G03F7/20;H01L21/027 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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