| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device which can control the size, interval, etc. of a pattern to be exposed to an object, and an exposure method therefor. <P>SOLUTION: An exposure mask 100 comprising a resiliently deformable holding member 101 and a light shielding film 102 having an opening pattern provided on the holding member is bent to be brought into contact with an object 206 to be exposed. Under this condition, exposure is carried out. And a distance is detected by a distance detecting means 214 between the exposure mask 100 and the object 206 before the mask 100 is bent, and the distance between the exposure mask 100 and the object 206 before the mask 100 is bent is controlled by a distance control means 201 on the basis of signals from the distance detecting means 214. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
