| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer for a resist composition, a positive resist composition and a resist pattern forming method excellent in definition and resist pattern profiles, and to provide a polymer for a resist composition, a positive resist composition and a resist pattern forming method excellent in solubility in organic solvents and capable of reducing defect risk. <P>SOLUTION: The polymer for a resist composition comprises a structural unit (a1) derived from a (meth)acrylate containing an acid-dissociable dissolution inhibiting group, a structural unit (a2) derived from a (meth)acrylate containing a monocyclic or polycyclic lactone residue having no alkyl group, and a structural unit (a3) represented by general formula (3). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
