| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry etching method processing an etching object layer into a shape of a desired rugged pattern with a high precision, a magnetic recording medium manufacturing method utilizing the same, and a magnetic recording medium which has a recording layer formed into a rugged pattern and allows good magnetic characteristics to be surely obtained. SOLUTION: The recording layer (the etching object layer), a main mask layer, an auxiliary mask layer are formed on a substrate in this order, and the auxiliary mask layer is processed into a prescribed rugged pattern (S106), and the main mask layer in recessed parts is removed by reactive ion etching using oxygen or ozone as reactive gas (S108), and furthermore, the recording layer in the recessed parts is removed by dry etching to process the recording layer into the shape of the rugged pattern (S110). The main mask layer mainly consists of carbon, and a material of which the etching rate in reactive ion etching in the main mask layer processing step (S108) is lower than that of carbon is used as the material of the auxiliary mask layer. COPYRIGHT: (C)2006,JPO&NCIPI
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