发明名称 Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof
摘要 Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.
申请公布号 US2006006981(A1) 申请公布日期 2006.01.12
申请号 US20050175431 申请日期 2005.07.07
申请人 SEO HYEOUNG-WON;KIM SUN-JOON;SHIN SHANG-KYU;KIM HYUN-CHANG 发明人 SEO HYEOUNG-WON;KIM SUN-JOON;SHIN SHANG-KYU;KIM HYUN-CHANG
分类号 H01C1/01 主分类号 H01C1/01
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