发明名称 |
Resistor element with uniform resistance being independent of process variations, semiconductor integrated circuit device having the same, and fabrication methods thereof |
摘要 |
Provided is a resistor element including a resistor formed on an insulating layer, and a complementary resistor formed on the insulating layer and insulated from the resistor, the complementary resistor electrically connected in parallel to the resistor, wherein a resistance of the complementary resistor is complementary to a resistance of the resistor. A semiconductor integrated circuit device including the resistor element, and methods of fabricating the resistor element and the semiconductor integrated circuit device are also provided.
|
申请公布号 |
US2006006981(A1) |
申请公布日期 |
2006.01.12 |
申请号 |
US20050175431 |
申请日期 |
2005.07.07 |
申请人 |
SEO HYEOUNG-WON;KIM SUN-JOON;SHIN SHANG-KYU;KIM HYUN-CHANG |
发明人 |
SEO HYEOUNG-WON;KIM SUN-JOON;SHIN SHANG-KYU;KIM HYUN-CHANG |
分类号 |
H01C1/01 |
主分类号 |
H01C1/01 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|