| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist material superior in transmittance to exposure light, having a wavelength of ≤300 nm band, and in adhesion with respect to the substrate and solubility in developer. <P>SOLUTION: The resist material includes a base resin containing a unit represented by Formula (1), wherein R<SP>5</SP>is H, a 1-20C straight-chain alkyl group, a 1-20C branched or cyclic alkyl group, a 1-20C fluorinated alkyl group or a protecting group released by an acid; and R<SP>6</SP>is a group having a cyclic ester compound, a group having an alicyclic compound including a hydroxyl group or a group having a compound containing hexafluoroisopropyl alcohol. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
