| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve matching deviation precision in an actual exposure stage by applying a statistical model and predicting a matching deviation correction value. <P>SOLUTION: An exposure method has a calculating means (S13) of calculating a 1st matching deviation value (optimum matching deviation value) from existent data, a predicting means (S14) of performing calculation processing for the calculated 1st matching deviation value with the statistical model and predicting a 2nd matching deviation correction value (matching deviation value used for this lot) to be used in an exposure processing stage, and an exposure processing means (S16) of performing the exposure processing stage by using the predicted 2nd matching deviation correction value. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
