| 摘要 |
PROBLEM TO BE SOLVED: To solve the problem of withstand voltage property by eliminating needs to apply high voltage to a BAA electrode, and to realize processing operation at high speed. SOLUTION: After the electronic beam EB irradiated from an electron source 101 is accelerated and is almost parallelized, the device is provided with a means for dividing the electronic beam to multi-electron beams with an aperture array 121, BAA 122 as a blanking means for turning on and off each multi-electron beam, a lens array 124 as a means for converging each multi-electron beam, and a contracted projection system 130 for contracting and projecting the multi-electron beams. The BAA 122 is provided in an intermediate voltage area to the final acceleration potential of the electronic beam. COPYRIGHT: (C)2006,JPO&NCIPI
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