| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography apparatus in which possibility of damage is reduced in the case that a support structure of a substrate and/or a device having a pattern formed thereon are/is collided with an edge of a support surface. <P>SOLUTION: The lithography apparatus includes an illumination system for providing a radiation beam, a support surface having edges, and a support structure for supporting an object that is moved in such a manner of crossing the radiation beam. The support structure is movably supported on the support surface. The apparatus further includes a rim associated with the support surface. The support structure and the rim are configured such that the support structure is moved in a first direction to the rim until it is collided with the rim. Total force generated by collision on the support structure is directed at least partially to be out of a second direction opposite to the first direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
