发明名称 TEMPERATURE- AND PHOTO-RESPONDING COMPOSITION AND CELL-CULTURING SUBSTRATE PRODUCED FROM THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a cell-culturing substrate having a temperature- and photo-responding surface whose cell adhesiveness can be locally raised or reduced with a high contrast and reversibility at a specified region by photo-irradiation before and/or after seeding a cell, and to provide a temperature- and photo-responding composition comprised of the same. <P>SOLUTION: The temperature- and photo-responding composition comprises an acrylamide-based monomer component, that composes a temperature-responding polymer, and a monomer component having a spirobenzopyran and/or spirooxazine residue having photoresponsiveness and contains at least as one component a photo-responding copolymer whose cell adhesiveness changes responding to photoirradiation and/or to temperature change, thus the composition provides a measure for fractional recovery of only a desired cell or a cell group selectively without injuring activity of a cultured cell or without any complicated operation for incubation according to a desired pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006008975(A) 申请公布日期 2006.01.12
申请号 JP20040365576 申请日期 2004.12.17
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 SUMARU KIMIO;EDAHIRO JUNICHI;TADA YUICHI;KANAMORI TOSHIYUKI;KAMEDA MITSUYOSHI
分类号 C08F220/54;C09K9/02;C12N5/07;C12N5/071 主分类号 C08F220/54
代理机构 代理人
主权项
地址