发明名称 |
TEMPERATURE- AND PHOTO-RESPONDING COMPOSITION AND CELL-CULTURING SUBSTRATE PRODUCED FROM THE SAME |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a cell-culturing substrate having a temperature- and photo-responding surface whose cell adhesiveness can be locally raised or reduced with a high contrast and reversibility at a specified region by photo-irradiation before and/or after seeding a cell, and to provide a temperature- and photo-responding composition comprised of the same. <P>SOLUTION: The temperature- and photo-responding composition comprises an acrylamide-based monomer component, that composes a temperature-responding polymer, and a monomer component having a spirobenzopyran and/or spirooxazine residue having photoresponsiveness and contains at least as one component a photo-responding copolymer whose cell adhesiveness changes responding to photoirradiation and/or to temperature change, thus the composition provides a measure for fractional recovery of only a desired cell or a cell group selectively without injuring activity of a cultured cell or without any complicated operation for incubation according to a desired pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
申请公布号 |
JP2006008975(A) |
申请公布日期 |
2006.01.12 |
申请号 |
JP20040365576 |
申请日期 |
2004.12.17 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
SUMARU KIMIO;EDAHIRO JUNICHI;TADA YUICHI;KANAMORI TOSHIYUKI;KAMEDA MITSUYOSHI |
分类号 |
C08F220/54;C09K9/02;C12N5/07;C12N5/071 |
主分类号 |
C08F220/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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