发明名称 MANUFACTURING METHOD FOR SUBSTRATE FOR GAS DISCHARGE PANEL AND GAS DISCHARGE PANEL
摘要 PROBLEM TO BE SOLVED: To provide a new technique for an electrode which can be used for a gas discharge panel, a substrate for the gas discharge panel, the gas discharge panel and a gas discharge panel display device. SOLUTION: A self-organization film is formed on a rib formation surface of the substrate for the gas discharge panel, and a part of the self-organization film is activated so that a material serving as a plating catalyst can be adhered. The material serving as a plating catalyst is adhered to the activated part to be a plating catalyst. By an electroless plating method utilizing the plating catalyst, an electroless plating layer is formed in the upper part of the part of the self-organization film. Thus, an address electrode is formed. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006012571(A) 申请公布日期 2006.01.12
申请号 JP20040187296 申请日期 2004.06.25
申请人 FUJITSU LTD;ADVANCED PDP DEVELOPMENT CORP 发明人 TOKAI AKIRA;TOYODA OSAMU;INOUE KAZUNORI
分类号 H01J9/02;H01J9/24;H01J11/22;H01J11/34 主分类号 H01J9/02
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