摘要 |
PROBLEM TO BE SOLVED: To provide a sealing material which shows an increased solvent resistance and moisture permeation barrier property and can follow expansion and shrinkage of an adherend induced by a heat cycle. SOLUTION: The photocurable composition essentially comprises (A) a polymer which is a polybutadiene having a terminal (meth)acrylic group and a hydrogenated main backbone, (B) a saturated aliphatic elastomer and (C) a photopolymerization initiator. Alternatively, the photocurable composition essentially comprises (D) a chain aliphatic or alicyclic monofunctional (meth)acrylate having 5 or more carbons in addition to components (A)-(C). COPYRIGHT: (C)2006,JPO&NCIPI
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