发明名称 METHOD FOR STRUCTURED APPLICATION OF A LAMINATABLE FILM TO A SUBSTRATE FOR A SEMICONDUCTOR MODULE
摘要 A method for structured application of a laminatable intermediate layer (9) to a substrate (1) for a semiconductor module, wherein a separating layer is indirectly or directly applied to said substrate (1) over a large surface, the intermediate layer (9) is applied to the substrate (1), including the separating layer(s), by means of lamination, over a large surface, the intermediate layer (9) is opened in places on said substrate (1), where recesses are provided for the intermediate layer (9), and the separating layer (8) is removed in said places.
申请公布号 WO2005101496(A3) 申请公布日期 2006.01.12
申请号 WO2005EP03325 申请日期 2005.03.30
申请人 EUPEC EUROPAEISCHE GESELLSCHAFT FUER LEISTUNGSHALBLEITER MBH;LICHT, THOMAS;KEMPER. ALFRED 发明人 LICHT, THOMAS;KEMPER. ALFRED
分类号 H01L21/48;H01L23/31;H01L23/538;H05K3/00;H05K3/28 主分类号 H01L21/48
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